Optoelektronìka ta napìvprovìdnikova tehnìka
Abbreviated key-title: Optoelektron. napìvprovìd. teh.
(Parallel title: Optoelectronics and Semiconductor Technics)
ISSN 1011-6559 (from 1982 to 2018) | ISSN 2707-6806 (print) ISSN 2707-6792 (online)
https://doi.org/10.15407/jopt / https://doi.org/10.15407/iopt
V. 55 (2020) | to Ukrainian version
To the anniversary of V. Lashkaryov Institute of Semiconductor Physics NAS of Ukraine
Optoelektron. napìvprovìd. teh. 55, 5-8 (2020)
M.M. Grigoryev, M. Yu. Kravetskii, I.M. Matiyuk, V.F. Onyschenko, A.V. Sukach, V.V. Tetyorkin
Academician O.G. Goldman in exile. The long and difficult way to return to Ukraine (Review. Part II)
Optoelektron. napìvprovìd. teh. 55, 9-57 (2020)
W.H. Kozyrski, V.A. Shenderovskyi
To the history of theoretical researches at the Institute of physics of NAS of Ukraine
Optoelektron. napìvprovìd. teh. 55, 58-82 (2020)
A.V. Sukach, V.V. Tetorkin,V.I. Ivashchenko, O.K. Porada, A.O. Kozak, A.I. Tkachuk, I.M. Matiyuk
SiCN films: preparation, properties and practical application (Review)
Optoelektron. napìvprovìd. teh. 55, 83-108 (2020)
Ya.M. Olikh, M.D. Tymochko, V.V. Kaliuzhnyi, A.E. Belyaev
Peculiarities of acoustic induced changes of electrophysical characterisctics in GaN/Al0,2Ga0,8N/GaN/AlN heterostructures
Optoelektron. napìvprovìd. teh. 55, 109-116 (2020)
I.Z. Indutnyi, V.I. Mynko, M.V. Sopinskyy, V.A. Dan’ko, P.M. Lytvyn, A.A. Korchovyi
Dependence of surface plasmon polyariton excitation efficiency on aluminium gratings relief depth
Optoelektron. napìvprovìd. teh. 55, 117-125 (2020)
G.V. Dorozinsky, K.S. Dremliuzhenko, O.A. Kapush, D.V. Korbutyak, V.P. Maslov
Investigation of CdTe quantum dots synthesis technology features in colloid solutions by photoluminescent spectroscopy and surface plasmon resonance refractometry
Optoelektron. napìvprovìd. teh. 55, 126-135 (2020)
Yu.M. Shirshov, K.V. Kostyukevych, R.V. Khrystosenko, A.V. Samoylov, Yu.V. Ushenin, N.Ya. Gridina
Analysis of forming blood elements using surface plasmon-polariton resonance model of transition layer
Optoelektron. napìvprovìd. teh. 55, 136-150 (2020)
A.V. Samoylov
Optimization of the design of polymer quarter superachromatic waveplates
Optoelektron. napìvprovìd. teh. 55, 151-155 (2020)
A.A. Efremov, O.S. Oberemok, O.V. Kosulya
Influence of local mechanical stresses on the silicon sputtering yield by ion beam
Optoelektron. napìvprovìd. teh. 55, 156-172 (2020)
A.V.Samoylov
Regularities of formation of synthetic optical anisotropy of polymethil methacrulate for polarimetric application
Optoelektron. napìvprovìd. teh. 55, 173-178 (2020)
H.V. Dorozinska,G.V. Dorozinsky, V.P. Sobol, V.V. Vovk, G.M. Androsjuk, V.P. Maslov, N.V. Kachur
Influence material of prism on the sensitivity of SPR sensors
Optoelektron. napìvprovìd. teh. 55, 179-185 (2020)
