CONTENTS

To the anniversary of V. Lashkaryov Institute of Semiconductor Physics NAS of Ukraine

Optoelectron. Semicond. Tech. 55, 5-8 (2020)

M.M. Grigoryev, M. Yu. Kravetskii, I.M. Matiyuk, V.F. Onyschenko, A.V. Sukach, V.V. Tetyorkin

Academician O.G. Goldman in exile. The long and difficult way to return to Ukraine (Review. Part II)

Optoelectron. Semicond. Tech. 55, 9-57 (2020)

W.H. Kozyrski, V.A. Shenderovskyi

To the history of theoretical researches at the Institute of physics of NAS of Ukraine

Optoelectron. Semicond. Tech. 55, 58-82 (2020)

A.V. Sukach, V.V. Tetorkin,V.I. Ivashchenko, O.K. Porada, A.O. Kozak, A.I. Tkachuk, I.M. Matiyuk

SiCN films: preparation, properties and practical application (Review)

Optoelectron. Semicond. Tech. 55, 83-108 (2020)

Ya.M. Olikh, M.D. Tymochko, V.V. Kaliuzhnyi, A.E. Belyaev

Peculiarities of acoustic induced changes of electrophysical characterisctics in GaN/Al_0,2Ga_0,8N/GaN/AlN heterostructures

Optoelectron. Semicond. Tech. 55, 109-116 (2020)

I.Z. Indutnyi, V.I. Mynko, M.V. Sopinskyy, V.A. Dan’ko, P.M. Lytvyn, A.A. Korchovyi

Dependence of surface plasmon polyariton excitation efficiency on aluminium gratings relief depth

Optoelectron. Semicond. Tech. 55, 117-125 (2020)

G.V. Dorozinsky, K.S. Dremliuzhenko, O.A. Kapush, D.V. Korbutyak, V.P. Maslov

Investigation of CdTe quantum dots synthesis technology features in colloid solutions by photoluminescent spectroscopy and surface plasmon resonance refractometry

Optoelectron. Semicond. Tech. 55, 126-135 (2020)

Yu.M. Shirshov, K.V. Kostyukevych, R.V. Khrystosenko, A.V. Samoylov, Yu.V. Ushenin, N.Ya. Gridina

Analysis of forming blood elements using surface plasmon-polariton resonance model of transition layer

Optoelectron. Semicond. Tech. 55, 136-150 (2020)

A.V. Samoylov

Optimization of the design of polymer quarter superachromatic waveplates

Optoelectron. Semicond. Tech. 55, 151-155 (2020)

A.A. Efremov, O.S. Oberemok, O.V. Kosulya

Influence of local mechanical stresses on the silicon sputtering yield by ion beam

Optoelectron. Semicond. Tech. 55, 156-172 (2020)

A.V.Samoylov

Regularities of formation of synthetic optical anisotropy of polymethil methacrulate for polarimetric application

Optoelectron. Semicond. Tech. 55, 173-178 (2020)

H.V. Dorozinska,G.V. Dorozinsky, V.P. Sobol, V.V. Vovk, G.M. Androsjuk, V.P. Maslov, N.V. Kachur

Influence material of prism on the sensitivity of SPR sensors

Optoelectron. Semicond. Tech. 55, 179-185 (2020)