https://doi.org/10.15407/jopt.2016.51.043

Optoelectron. Semicond. Tech. 51, 43-68 (2016)

A.V. Sukach, V.V. Tetyorkin, I.M. Matiyuk, A.I. Tkachuk

InSb Photodiodes (Review, Part I)

The current state of development of InSb photodiodes prepared using ion implantation method has been considered. Specific features of formation of disordered layer depending on the mass of ions, their energy and dose radiation have been analyzed. The conclusions on the effectiveness of stationary and pulsed photon annealings of radiation damages have been made. The results of studying the annealing on transformation of electrical and photoelectric properties and characteristics of the initial InSb have been presented. A model of the conductivity type conversion caused by thermal annealing of n-InSb has been proposed. The carrier transport mechanisms in InSb photodiodes produced using ion implantation have been analyzed, and conclusions on the nature of excessive currents has been made.

Keywords: InSb photodiode, ion implantation, damage layer, excessive tunneling current, p-n heterojunction.